High Performance Lithography Hotspot Detection with Hierarchically Refined Machine Learning Methods
نویسندگان
چکیده
Lithography hotspot detection faces three challenges: 1) real hotspots are now harder to fix; 2) false alarm rate must be minimized; 3), full chip physical verification and optimization require fast turnaround. We propose a lithographic hotspot detection flow with ultra-fast speed and high fidelity that is especially suitable for guiding lithography-friendly design under real manufacturing conditions.
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